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Silicon(IV) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick; 99.995% (metals basis)

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Formula: SiO2.x(H2O)
CAS: 10279-57-9
search Element: sputtering silicon metals target 250in basis oxide thick 35mm
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Identification

Structural Formula
Silicon(IV) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick; 99.995% (metals basis)
CAS:
10279-57-9
EINECS:
238-878-4
Molecular Formula:
SiO2.x(H2O)
MDL:
MFCD00011232
Synonym:
h-magadiite ; silica, hydrate(8ci,9ci) ; desiccant ; davisil ; baker sand ; silicon dioxide hydrate ; silex ; sand ; blue gel ; celite(r) ; sio2/si ; kieselguhr ; sio2




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Properties for Silicon(IV) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick; 99.995% (metals basis)

Molecular Weight:
60.08 g·mol−1
Density:
2.6 g/mL at 25 °C(lit.)
Melting point:
>100 °C(lit.)
Boiling point:
>100 °C(lit.)
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Hazard Statements

Safety & Transport Information

Risk Codes:
R48/20 - Harmful: danger of serious damage to health by prolonged exposure through inhalation
Safety Codes:
S22 - Do not breathe dust
Hazard Symbols:
Xn
Hazard symbol Xn
Storage temperature :
2-8°C
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Alternative Distributors of [Silicon(IV) oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick; 99.995% (metals basis)]

Producers or manufacturers change the product range from time to time. The following companies
have appeared as suppliers in the past / currently not verified

Jinan Great Chemical Co., Ltd. | WuHan Rison Trading Co.,Ltd. | Xuzhou Tianhao Chemical Technology Co., Ltd. | Wanko Chemical Co., Ltd.

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